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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/ibmrd/IyerFBCCJLMNNNPSSVWWYCA11>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/A._I._Chou>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/C._Brodsky>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/C._D._Sheraw>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/D._Corliss>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/E._Crabbe>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/G._Freeman>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/G._Wang>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/James_P._Norum>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/K._A._Nummy>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/M._E._Weybright>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Naftali_E._Lustig>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/P._R._Varanasi>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Paul_C._Parries>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Paul_D._Agnello>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/S._H._Jain>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/S._Sankaran>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Shreesh_Narasimha>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Subramanian_S._Iyer>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/V._McGahay>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/X._Yu>
foaf:homepage <http://dx.doi.org/10.1147%2FJRD.2011.2108112>
foaf:homepage <http://dx.doi.org/10.1147/JRD.2011.2108112>
dc:identifier DBLP journals/ibmrd/IyerFBCCJLMNNNPSSVWWYCA11 (xsd:string)
dc:identifier DOI 10.1147%2FJRD.2011.2108112 (xsd:string)
dcterms:issued 2011 (xsd:gYear)
swrc:journal <http://dblp.l3s.de/d2r/resource/journals/ibmrd>
rdfs:label 45-nm silicon-on-insulator CMOS technology integrating embedded DRAM for high-performance server and ASIC applications. (xsd:string)
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/A._I._Chou>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/C._Brodsky>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/C._D._Sheraw>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/D._Corliss>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/E._Crabbe>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/G._Freeman>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/G._Wang>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/James_P._Norum>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/K._A._Nummy>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/M._E._Weybright>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Naftali_E._Lustig>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/P._R._Varanasi>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Paul_C._Parries>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Paul_D._Agnello>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/S._H._Jain>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/S._Sankaran>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Shreesh_Narasimha>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Subramanian_S._Iyer>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/V._McGahay>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/X._Yu>
swrc:number 3 (xsd:string)
swrc:pages 5 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/ibmrd/IyerFBCCJLMNNNPSSVWWYCA11/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/ibmrd/IyerFBCCJLMNNNPSSVWWYCA11>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/ibmrd/ibmrd55.html#IyerFBCCJLMNNNPSSVWWYCA11>
rdfs:seeAlso <http://dx.doi.org/10.1147/JRD.2011.2108112>
dc:title 45-nm silicon-on-insulator CMOS technology integrating embedded DRAM for high-performance server and ASIC applications. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 55 (xsd:string)