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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/mr/NingZLHCBZ12>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Bingxu_Ning>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Dawei_Bi>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Ming_Chen>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Shichang_Zou>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Zhangli_Liu>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Zhengxuan_Zhang>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Zhiyuan_Hu>
foaf:homepage <http://dx.doi.org/10.1016%2Fj.microrel.2011.07.090>
foaf:homepage <http://dx.doi.org/10.1016/j.microrel.2011.07.090>
dc:identifier DBLP journals/mr/NingZLHCBZ12 (xsd:string)
dc:identifier DOI 10.1016%2Fj.microrel.2011.07.090 (xsd:string)
dcterms:issued 2012 (xsd:gYear)
swrc:journal <http://dblp.l3s.de/d2r/resource/journals/mr>
rdfs:label Radiation-induced shallow trench isolation leakage in 180-nm flash memory technology. (xsd:string)
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Bingxu_Ning>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Dawei_Bi>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Ming_Chen>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Shichang_Zou>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Zhangli_Liu>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Zhengxuan_Zhang>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Zhiyuan_Hu>
swrc:number 1 (xsd:string)
swrc:pages 130-136 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/mr/NingZLHCBZ12/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/mr/NingZLHCBZ12>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/mr/mr52.html#NingZLHCBZ12>
rdfs:seeAlso <http://dx.doi.org/10.1016/j.microrel.2011.07.090>
dc:title Radiation-induced shallow trench isolation leakage in 180-nm flash memory technology. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 52 (xsd:string)