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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/journals/tvlsi/HwangR10>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Kaushik_Roy>
dc:creator <http://dblp.l3s.de/d2r/resource/authors/Myeong-Eun_Hwang>
foaf:homepage <http://dx.doi.org/10.1109%2FTVLSI.2008.2010767>
foaf:homepage <http://dx.doi.org/10.1109/TVLSI.2008.2010767>
dc:identifier DBLP journals/tvlsi/HwangR10 (xsd:string)
dc:identifier DOI 10.1109%2FTVLSI.2008.2010767 (xsd:string)
dcterms:issued 2010 (xsd:gYear)
swrc:journal <http://dblp.l3s.de/d2r/resource/journals/tvlsi>
rdfs:label ABRM: Adaptive Beta -Ratio Modulation for Process-Tolerant Ultradynamic Voltage Scaling. (xsd:string)
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Kaushik_Roy>
foaf:maker <http://dblp.l3s.de/d2r/resource/authors/Myeong-Eun_Hwang>
swrc:number 2 (xsd:string)
swrc:pages 281-290 (xsd:string)
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/journals/tvlsi/HwangR10/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/journals/tvlsi/HwangR10>
rdfs:seeAlso <http://dblp.uni-trier.de/db/journals/tvlsi/tvlsi18.html#HwangR10>
rdfs:seeAlso <http://dx.doi.org/10.1109/TVLSI.2008.2010767>
dc:title ABRM: Adaptive Beta -Ratio Modulation for Process-Tolerant Ultradynamic Voltage Scaling. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:Article
rdf:type foaf:Document
swrc:volume 18 (xsd:string)