Development of high-quality low-temperature (‚ȧ 120¬įC) PECVD-SiN films by organosilane.
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/3dic/TakaSTM15
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Hiroshi_Taka
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Katsumasa_Suzuki
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Norihiro_Tsujioka
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Shoichi_Murakami
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2F3DIC.2015.7334600
>
foaf:
homepage
<
https://doi.org/10.1109/3DIC.2015.7334600
>
dc:
identifier
DBLP conf/3dic/TakaSTM15
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2F3DIC.2015.7334600
(xsd:string)
dcterms:
issued
2015
(xsd:gYear)
rdfs:
label
Development of high-quality low-temperature (‚ȧ 120¬įC) PECVD-SiN films by organosilane.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Hiroshi_Taka
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Katsumasa_Suzuki
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Norihiro_Tsujioka
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Shoichi_Murakami
>
swrc:
pages
TS8.2.1-TS8.2.4
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/3dic/2015
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/3dic/TakaSTM15/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/3dic/TakaSTM15
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/3dic/3dic2015.html#TakaSTM15
>
rdfs:
seeAlso
<
https://doi.org/10.1109/3DIC.2015.7334600
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/3dic
>
dc:
title
Development of high-quality low-temperature (‚ȧ 120¬įC) PECVD-SiN films by organosilane.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document