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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/3dic/TakaSTM15>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hiroshi_Taka>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Katsumasa_Suzuki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Norihiro_Tsujioka>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shoichi_Murakami>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2F3DIC.2015.7334600>
foaf:homepage <https://doi.org/10.1109/3DIC.2015.7334600>
dc:identifier DBLP conf/3dic/TakaSTM15 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2F3DIC.2015.7334600 (xsd:string)
dcterms:issued 2015 (xsd:gYear)
rdfs:label Development of high-quality low-temperature (‚ȧ 120¬įC) PECVD-SiN films by organosilane. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hiroshi_Taka>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Katsumasa_Suzuki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Norihiro_Tsujioka>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shoichi_Murakami>
swrc:pages TS8.2.1-TS8.2.4 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/3dic/2015>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/3dic/3dic2015.html#TakaSTM15>
rdfs:seeAlso <https://doi.org/10.1109/3DIC.2015.7334600>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/3dic>
dc:title Development of high-quality low-temperature (‚ȧ 120¬įC) PECVD-SiN films by organosilane. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document