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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/amcc/KangM04>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wei_Kang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ziqiang_John_Mao>
foaf:homepage <http://dx.doi.org/doi.org%2F10.23919%2FACC.2004.1386769>
foaf:homepage <https://doi.org/10.23919/ACC.2004.1386769>
dc:identifier DBLP conf/amcc/KangM04 (xsd:string)
dc:identifier DOI doi.org%2F10.23919%2FACC.2004.1386769 (xsd:string)
dcterms:issued 2004 (xsd:gYear)
rdfs:label Adaptive modeling and H‚ąě control for photolithography manufacturing process. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wei_Kang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ziqiang_John_Mao>
swrc:pages 1392-1393 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/amcc/2004>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/amcc/KangM04/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/amcc/KangM04>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/amcc/acc2004.html#KangM04>
rdfs:seeAlso <https://doi.org/10.23919/ACC.2004.1386769>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/amcc>
dc:title Adaptive modeling and H‚ąě control for photolithography manufacturing process. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document