Analog VLSI circuits for manufacturing inspection.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/arvlsi/MorrisWD95
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/arvlsi/MorrisWD95
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Denise_M._Wilson
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Stephen_P._DeWeerth
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Tonia_G._Morris
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FARVLSI.1995.515624
>
foaf:
homepage
<
https://doi.org/10.1109/ARVLSI.1995.515624
>
dc:
identifier
DBLP conf/arvlsi/MorrisWD95
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FARVLSI.1995.515624
(xsd:string)
dcterms:
issued
1995
(xsd:gYear)
rdfs:
label
Analog VLSI circuits for manufacturing inspection.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Denise_M._Wilson
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Stephen_P._DeWeerth
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Tonia_G._Morris
>
swrc:
pages
241-257
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/arvlsi/1995
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/arvlsi/MorrisWD95/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/arvlsi/MorrisWD95
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/arvlsi/arvlsi1995.html#MorrisWD95
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ARVLSI.1995.515624
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/arvlsi
>
dc:
subject
automatic optical inspection; VLSI; CMOS analogue integrated circuits; manufacture; edge detection; mathematical morphology; computer vision; analogue processing circuits; focal planes; analog VLSI circuits; manufacturing inspection; morphological operations; programmable structuring elements; oriented edge detection; high speed preprocessors; selective attention; serial/parallel processing; machine vision; focal-plane processing; massively parallel architectures; vertical bipolar phototransistors; digital CMOS process; adaptive image threshold; 2.0 micron
(xsd:string)
dc:
title
Analog VLSI circuits for manufacturing inspection.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document