Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/asicon/JiangQCC11
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/asicon/JiangQCC11
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Lele_Jiang
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Lifu_Chang
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Xiaojing_Qin
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Yuhua_Cheng
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FASICON.2011.6157339
>
foaf:
homepage
<
https://doi.org/10.1109/ASICON.2011.6157339
>
dc:
identifier
DBLP conf/asicon/JiangQCC11
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FASICON.2011.6157339
(xsd:string)
dcterms:
issued
2011
(xsd:gYear)
rdfs:
label
Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Lele_Jiang
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Lifu_Chang
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Xiaojing_Qin
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Yuhua_Cheng
>
swrc:
pages
854-857
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/asicon/2011
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/asicon/JiangQCC11/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/asicon/JiangQCC11
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/asicon/asicon2011.html#JiangQCC11
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ASICON.2011.6157339
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/asicon
>
dc:
title
Characterization and analysis of pattern dependent variation-aware interconnects for a 65nm technology.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document