Pitch Device Design in 10nm-Class DRAM Process through DTCO.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/asicon/TangLSZWKLMC21
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/asicon/TangLSZWKLMC21
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Bernard_Wu
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Fengqin_Zhang
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Hong_Ma
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Hongwen_Li
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Kanyu_Cao
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Weibing_Shang
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Yanzhe_Tang
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Zhong_Kong
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Zhongming_Liu
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FASICON52560.2021.9620445
>
foaf:
homepage
<
https://doi.org/10.1109/ASICON52560.2021.9620445
>
dc:
identifier
DBLP conf/asicon/TangLSZWKLMC21
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FASICON52560.2021.9620445
(xsd:string)
dcterms:
issued
2021
(xsd:gYear)
rdfs:
label
Pitch Device Design in 10nm-Class DRAM Process through DTCO.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Bernard_Wu
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Fengqin_Zhang
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Hong_Ma
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Hongwen_Li
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Kanyu_Cao
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Weibing_Shang
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Yanzhe_Tang
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Zhong_Kong
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Zhongming_Liu
>
swrc:
pages
1-4
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/asicon/2021
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/asicon/TangLSZWKLMC21/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/asicon/TangLSZWKLMC21
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/asicon/asicon2021.html#TangLSZWKLMC21
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ASICON52560.2021.9620445
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/asicon
>
dc:
title
Pitch Device Design in 10nm-Class DRAM Process through DTCO.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document