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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/cdc/KangM04>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wei_Kang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ziqiang_John_Mao>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FCDC.2004.1429416>
foaf:homepage <https://doi.org/10.1109/CDC.2004.1429416>
dc:identifier DBLP conf/cdc/KangM04 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FCDC.2004.1429416 (xsd:string)
dcterms:issued 2004 (xsd:gYear)
rdfs:label An adaptive model for the control of critical dimension in photolithography process. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wei_Kang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ziqiang_John_Mao>
swrc:pages 4231-4236 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/cdc/2004>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/cdc/KangM04/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/cdc/KangM04>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/cdc/cdc2004.html#KangM04>
rdfs:seeAlso <https://doi.org/10.1109/CDC.2004.1429416>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/cdc>
dc:title An adaptive model for the control of critical dimension in photolithography process. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document