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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/cicc/SuSLYLXCHCDH03>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Carlos_H._Diaz>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chenming_Hu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chung-Kai_Lin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chung-Shi_Chiang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jaw-Kang_Her>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ke-Wei_Su>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sheng-Jier_Yang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wen-Jya_Liang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xuemei_Xi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yi-Ming_Sheu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yu-Tai_Chia>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FCICC.2003.1249396>
foaf:homepage <https://doi.org/10.1109/CICC.2003.1249396>
dc:identifier DBLP conf/cicc/SuSLYLXCHCDH03 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FCICC.2003.1249396 (xsd:string)
dcterms:issued 2003 (xsd:gYear)
rdfs:label A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Carlos_H._Diaz>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chenming_Hu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chung-Kai_Lin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chung-Shi_Chiang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jaw-Kang_Her>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ke-Wei_Su>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sheng-Jier_Yang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wen-Jya_Liang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xuemei_Xi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yi-Ming_Sheu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yu-Tai_Chia>
swrc:pages 245-248 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/cicc/2003>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/cicc/SuSLYLXCHCDH03/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/cicc/SuSLYLXCHCDH03>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/cicc/cicc2003.html#SuSLYLXCHCDH03>
rdfs:seeAlso <https://doi.org/10.1109/CICC.2003.1249396>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/cicc>
dc:title A scaleable model for STI mechanical stress effect on layout dependence of MOS electrical characteristics. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document