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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/dac/YeLCC09>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Frank_Liu_0001>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Min_Chen_0024>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yu_Cao_0001>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yun_Ye>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1145%2F1629911.1630054>
foaf:homepage <https://doi.org/10.1145/1629911.1630054>
dc:identifier DBLP conf/dac/YeLCC09 (xsd:string)
dc:identifier DOI doi.org%2F10.1145%2F1629911.1630054 (xsd:string)
dcterms:issued 2009 (xsd:gYear)
rdfs:label Variability analysis under layout pattern-dependent rapid-thermal annealing process. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Frank_Liu_0001>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Min_Chen_0024>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yu_Cao_0001>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yun_Ye>
swrc:pages 551-556 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/dac/2009>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/dac/YeLCC09/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/dac/YeLCC09>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/dac/dac2009.html#YeLCC09>
rdfs:seeAlso <https://doi.org/10.1145/1629911.1630054>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/dac>
dc:subject dopant activation, layout pattern, physical design, rapid-thermal annealing, threshold voltage variation (xsd:string)
dc:title Variability analysis under layout pattern-dependent rapid-thermal annealing process. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document