[RDF data]
Home | Example Publications
PropertyValue
dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/date/HeoKKWY19>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Andrew_B._Kahng>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chutong_Yang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Lutong_Wang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Minsoo_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sun_ik_Heo>
foaf:homepage <http://dx.doi.org/doi.org%2F10.23919%2FDATE.2019.8715096>
foaf:homepage <https://doi.org/10.23919/DATE.2019.8715096>
dc:identifier DBLP conf/date/HeoKKWY19 (xsd:string)
dc:identifier DOI doi.org%2F10.23919%2FDATE.2019.8715096 (xsd:string)
dcterms:issued 2019 (xsd:gYear)
rdfs:label Detailed Placement for IR Drop Mitigation by Power Staple Insertion in Sub-10nm VLSI. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Andrew_B._Kahng>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chutong_Yang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Lutong_Wang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Minsoo_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sun_ik_Heo>
swrc:pages 830-835 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/date/2019>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/date/HeoKKWY19/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/date/HeoKKWY19>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/date/date2019.html#HeoKKWY19>
rdfs:seeAlso <https://doi.org/10.23919/DATE.2019.8715096>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/date>
dc:title Detailed Placement for IR Drop Mitigation by Power Staple Insertion in Sub-10nm VLSI. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document