Enhanced Drain Current in Transient Mode due to Long Ionization Time of Shallow Impurities at 4 K in 65-nm bulk Cryo CMOS Transistors.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/drc/MiyaoTIINISTU22
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/drc/MiyaoTIINISTU22
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Hiroki_Ishikuro
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Itsuki_Imanishi
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Ken_Uchida
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Masayuki_Ichikawa
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Munehiro_Tada
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Shuya_Nakagawa
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Takahisa_Tanaka
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Tomohisa_Miyao
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Toshitsugu_Sakamoto
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FDRC55272.2022.9855815
>
foaf:
homepage
<
https://doi.org/10.1109/DRC55272.2022.9855815
>
dc:
identifier
DBLP conf/drc/MiyaoTIINISTU22
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FDRC55272.2022.9855815
(xsd:string)
dcterms:
issued
2022
(xsd:gYear)
rdfs:
label
Enhanced Drain Current in Transient Mode due to Long Ionization Time of Shallow Impurities at 4 K in 65-nm bulk Cryo CMOS Transistors.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Hiroki_Ishikuro
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Itsuki_Imanishi
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Ken_Uchida
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Masayuki_Ichikawa
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Munehiro_Tada
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Shuya_Nakagawa
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Takahisa_Tanaka
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Tomohisa_Miyao
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Toshitsugu_Sakamoto
>
swrc:
pages
1-2
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/drc/2022
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/drc/MiyaoTIINISTU22/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/drc/MiyaoTIINISTU22
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/drc/drc2022.html#MiyaoTIINISTU22
>
rdfs:
seeAlso
<
https://doi.org/10.1109/DRC55272.2022.9855815
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/drc
>
dc:
title
Enhanced Drain Current in Transient Mode due to Long Ionization Time of Shallow Impurities at 4 K in 65-nm bulk Cryo CMOS Transistors.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document