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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/drc/OhmiKKHM20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Masakazu_Kataoka>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Masaki_Hayashi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Min_Gee_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rengie_Mark_D._Mailig>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FDRC50226.2020.9135170>
foaf:homepage <https://doi.org/10.1109/DRC50226.2020.9135170>
dc:identifier DBLP conf/drc/OhmiKKHM20 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FDRC50226.2020.9135170 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
rdfs:label Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Masakazu_Kataoka>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Masaki_Hayashi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Min_Gee_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rengie_Mark_D._Mailig>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shun%27ichiro_Ohmi>
swrc:pages 1-2 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/drc/2020>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/drc/OhmiKKHM20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/drc/OhmiKKHM20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/drc/drc2020.html#OhmiKKHM20>
rdfs:seeAlso <https://doi.org/10.1109/DRC50226.2020.9135170>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/drc>
dc:title Low-Voltage Operation of MFSFET with Ferroelectric Nondoped HfO2 Formed by Kr/O2-Plasma Sputtering. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document