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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/dtis/BenvenutiBFCCPT19>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Francesco_Tinfena>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Lorenzo_Benvenuti>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Luca_Fanucci>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Luigi_Di_Piro>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Paolo_Bruschi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Raffaele_Coppeta>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sara_Carniello>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FDTIS.2019.8734970>
foaf:homepage <https://doi.org/10.1109/DTIS.2019.8734970>
dc:identifier DBLP conf/dtis/BenvenutiBFCCPT19 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FDTIS.2019.8734970 (xsd:string)
dcterms:issued 2019 (xsd:gYear)
rdfs:label Modelling and measurements of thermomechanical stress induced drift on polysilicon resistors with different layout. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Francesco_Tinfena>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Lorenzo_Benvenuti>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Luca_Fanucci>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Luigi_Di_Piro>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Paolo_Bruschi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Raffaele_Coppeta>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sara_Carniello>
swrc:pages 1-5 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/dtis/2019>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/dtis/BenvenutiBFCCPT19/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/dtis/BenvenutiBFCCPT19>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/dtis/dtis2019.html#BenvenutiBFCCPT19>
rdfs:seeAlso <https://doi.org/10.1109/DTIS.2019.8734970>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/dtis>
dc:title Modelling and measurements of thermomechanical stress induced drift on polysilicon resistors with different layout. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document