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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/dtis/KraussWS17>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Frank_Wessely>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tillmann_Krauss>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Udo_Schwalke>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FDTIS.2017.7930155>
foaf:homepage <https://doi.org/10.1109/DTIS.2017.7930155>
dc:identifier DBLP conf/dtis/KraussWS17 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FDTIS.2017.7930155 (xsd:string)
dcterms:issued 2017 (xsd:gYear)
rdfs:label Fabrication and simulation of electrically reconfigurable dual metal-gate planar field-effect transistors for dopant-free CMOS. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Frank_Wessely>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tillmann_Krauss>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Udo_Schwalke>
swrc:pages 1-6 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/dtis/2017>
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owl:sameAs <http://dblp.rkbexplorer.com/id/conf/dtis/KraussWS17>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/dtis/dtis2017.html#KraussWS17>
rdfs:seeAlso <https://doi.org/10.1109/DTIS.2017.7930155>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/dtis>
dc:title Fabrication and simulation of electrically reconfigurable dual metal-gate planar field-effect transistors for dopant-free CMOS. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document