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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/essderc/AndrieuCBPNRBPPSGMBGGCBRPSRJWAVFH14>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/A._Cros>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/A._Pofelski>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Barbara_De_Salvo>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._Gallon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._Gaumer>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/D._Barge>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Denis_Rideau>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/E._Baylac>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/E._Richard>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Emmanuel_Josse>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Fran%E2%88%9A%C3%9Fois_Andrieu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Franck_Arnaud>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Franck_Pourchon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M._Haond>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Maud_Vinet>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Mika%E2%88%9A%C4%99l_Cass%E2%88%9A%C2%A9>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nicolas_Planes>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/O._Gourhant>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/O._Nier>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Olivier_Faynot>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Olivier_Weber>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/P._Perreau>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/R._Berthelon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rossella_Ranica>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/V._Barral>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Vincent_Mazzocchi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Walter_Schwarzenbach>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FESSDERC.2014.6948769>
foaf:homepage <https://doi.org/10.1109/ESSDERC.2014.6948769>
dc:identifier DBLP conf/essderc/AndrieuCBPNRBPPSGMBGGCBRPSRJWAVFH14 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FESSDERC.2014.6948769 (xsd:string)
dcterms:issued 2014 (xsd:gYear)
rdfs:label Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/A._Cros>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/A._Pofelski>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Barbara_De_Salvo>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._Gallon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._Gaumer>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/D._Barge>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Denis_Rideau>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/E._Baylac>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/E._Richard>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Emmanuel_Josse>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Fran%E2%88%9A%C3%9Fois_Andrieu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Franck_Arnaud>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Franck_Pourchon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M._Haond>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Maud_Vinet>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Mika%E2%88%9A%C4%99l_Cass%E2%88%9A%C2%A9>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nicolas_Planes>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/O._Gourhant>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/O._Nier>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Olivier_Faynot>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Olivier_Weber>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/P._Perreau>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/R._Berthelon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rossella_Ranica>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/V._Barral>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Vincent_Mazzocchi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Walter_Schwarzenbach>
swrc:pages 106-109 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/essderc/2014>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/essderc/AndrieuCBPNRBPPSGMBGGCBRPSRJWAVFH14/dblp>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/essderc/essderc2014.html#AndrieuCBPNRBPPSGMBGGCBRPSRJWAVFH14>
rdfs:seeAlso <https://doi.org/10.1109/ESSDERC.2014.6948769>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/essderc>
dc:title Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document