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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/essderc/KawanagoIWO16>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Du_Wanjing>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ryo_Ikoma>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shunri_Oda>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Takamasa_Kawanago>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FESSDERC.2016.7599643>
foaf:homepage <https://doi.org/10.1109/ESSDERC.2016.7599643>
dc:identifier DBLP conf/essderc/KawanagoIWO16 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FESSDERC.2016.7599643 (xsd:string)
dcterms:issued 2016 (xsd:gYear)
rdfs:label Adhesion lithography to fabricate MoS2 FETs with self-assembled monolayer-based gate dielectrics. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Du_Wanjing>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ryo_Ikoma>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shunri_Oda>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Takamasa_Kawanago>
swrc:pages 291-294 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/essderc/2016>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/essderc/KawanagoIWO16/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/essderc/KawanagoIWO16>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/essderc/essderc2016.html#KawanagoIWO16>
rdfs:seeAlso <https://doi.org/10.1109/ESSDERC.2016.7599643>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/essderc>
dc:title Adhesion lithography to fabricate MoS2 FETs with self-assembled monolayer-based gate dielectrics. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document