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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/etfa/GohTMA08>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Abdul_Manaf>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Anton_J._R._Aendenroomer>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Benny_Tjahjono>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kiah_Mok_Goh>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FETFA.2008.4638364>
foaf:homepage <https://doi.org/10.1109/ETFA.2008.4638364>
dc:identifier DBLP conf/etfa/GohTMA08 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FETFA.2008.4638364 (xsd:string)
dcterms:issued 2008 (xsd:gYear)
rdfs:label An IEC 61499 based run-to-run controller for chemical mechanical planarization process. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Abdul_Manaf>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Anton_J._R._Aendenroomer>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Benny_Tjahjono>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kiah_Mok_Goh>
swrc:pages 25-28 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/etfa/2008>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/etfa/GohTMA08/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/etfa/GohTMA08>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/etfa/etfa2008.html#GohTMA08>
rdfs:seeAlso <https://doi.org/10.1109/ETFA.2008.4638364>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/etfa>
dc:title An IEC 61499 based run-to-run controller for chemical mechanical planarization process. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document