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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/fgit/Oh11>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Teresa_Oh>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1007%2F978-3-642-27180-9%5F19>
foaf:homepage <https://doi.org/10.1007/978-3-642-27180-9_19>
dc:identifier DBLP conf/fgit/Oh11 (xsd:string)
dc:identifier DOI doi.org%2F10.1007%2F978-3-642-27180-9%5F19 (xsd:string)
dcterms:issued 2011 (xsd:gYear)
rdfs:label Correlation between Low Polarization and Roughness in Low-k SiOC Thin Films by Chemical Vapor Deposition. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Teresa_Oh>
swrc:pages 155-160 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/fgit/2011gdc>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/fgit/Oh11/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/fgit/Oh11>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/fgit/gdc2011.html#Oh11>
rdfs:seeAlso <https://doi.org/10.1007/978-3-642-27180-9_19>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/fgit>
dc:title Correlation between Low Polarization and Roughness in Low-k SiOC Thin Films by Chemical Vapor Deposition. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document