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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/iccd/BemBMRR11>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Andr%E2%88%9A%C2%A9_In%E2%88%9A%C2%B0cio_Reis>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Felipe_S._Marranghello>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Paulo_F._Butzen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Renato_P._Ribas>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Vin%E2%88%9A%E2%89%A0cius_Dal_Bem>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICCD.2011.6081409>
foaf:homepage <https://doi.org/10.1109/ICCD.2011.6081409>
dc:identifier DBLP conf/iccd/BemBMRR11 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICCD.2011.6081409 (xsd:string)
dcterms:issued 2011 (xsd:gYear)
rdfs:label Impact and optimization of lithography-aware regular layout in digital circuit design. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Andr%E2%88%9A%C2%A9_In%E2%88%9A%C2%B0cio_Reis>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Felipe_S._Marranghello>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Paulo_F._Butzen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Renato_P._Ribas>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Vin%E2%88%9A%E2%89%A0cius_Dal_Bem>
swrc:pages 279-284 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/iccd/2011>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/iccd/iccd2011.html#BemBMRR11>
rdfs:seeAlso <https://doi.org/10.1109/ICCD.2011.6081409>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/iccd>
dc:title Impact and optimization of lithography-aware regular layout in digital circuit design. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document