Chemical Bath Deposition of Cu2O Thin Films on FTO Substrates: Effect of Sequential Deposition.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/iceee/Reyes-VallejoSF22
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/iceee/Reyes-VallejoSF22
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/A._Ashok
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Arturo_Fern%E2%88%9A%C2%B0ndez-Madrigal
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Carlos_Alonso_Meza-Avenda%E2%88%9A%C4%AAo
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Francisco_J._Cano
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jos%E2%88%9A%C2%A9_Juan_D%E2%88%9A%E2%89%A0az
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Od%E2%88%9A%E2%89%A0n_Reyes-Vallejo
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/P._J._Sebastian
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Roc%E2%88%9A%E2%89%A0o_M._S%E2%88%9A%C2%B0nchez-Albores
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FCCE56709.2022.9975937
>
foaf:
homepage
<
https://doi.org/10.1109/CCE56709.2022.9975937
>
dc:
identifier
DBLP conf/iceee/Reyes-VallejoSF22
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FCCE56709.2022.9975937
(xsd:string)
dcterms:
issued
2022
(xsd:gYear)
rdfs:
label
Chemical Bath Deposition of Cu2O Thin Films on FTO Substrates: Effect of Sequential Deposition.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/A._Ashok
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Arturo_Fern%E2%88%9A%C2%B0ndez-Madrigal
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Carlos_Alonso_Meza-Avenda%E2%88%9A%C4%AAo
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Francisco_J._Cano
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jos%E2%88%9A%C2%A9_Juan_D%E2%88%9A%E2%89%A0az
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Od%E2%88%9A%E2%89%A0n_Reyes-Vallejo
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/P._J._Sebastian
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Roc%E2%88%9A%E2%89%A0o_M._S%E2%88%9A%C2%B0nchez-Albores
>
swrc:
pages
1-6
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/iceee/2022
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/iceee/Reyes-VallejoSF22/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/iceee/Reyes-VallejoSF22
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/iceee/cce2022.html#Reyes-VallejoSF22
>
rdfs:
seeAlso
<
https://doi.org/10.1109/CCE56709.2022.9975937
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/iceee
>
dc:
title
Chemical Bath Deposition of Cu2O Thin Films on FTO Substrates: Effect of Sequential Deposition.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document