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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/icicdt/RenWH16>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Pengpeng_Ren>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ru_Huang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Runsheng_Wang>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICICDT.2016.7542063>
foaf:homepage <https://doi.org/10.1109/ICICDT.2016.7542063>
dc:identifier DBLP conf/icicdt/RenWH16 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICICDT.2016.7542063 (xsd:string)
dcterms:issued 2016 (xsd:gYear)
rdfs:label Layout dependent BTI and HCI degradation in nano CMOS technology: A new time-dependent LDE and impacts on circuit at end of life. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Pengpeng_Ren>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ru_Huang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Runsheng_Wang>
swrc:pages 1-3 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/icicdt/2016>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/icicdt/RenWH16/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/icicdt/RenWH16>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/icicdt/icicdt2016.html#RenWH16>
rdfs:seeAlso <https://doi.org/10.1109/ICICDT.2016.7542063>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/icicdt>
dc:title Layout dependent BTI and HCI degradation in nano CMOS technology: A new time-dependent LDE and impacts on circuit at end of life. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document