Robust PEALD SiN spacer for gate first high-k metal gate integration.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/icicdt/TriyosoJSMHSL12
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/icicdt/TriyosoJSMHSL12
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/D._H._Triyoso
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jamie_K._Schaeffer
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Jeff_Shu
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Klaus_Hempel
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Markus_Lenski
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/S._Mutas
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/V._Jaschke
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FICICDT.2012.6232870
>
foaf:
homepage
<
https://doi.org/10.1109/ICICDT.2012.6232870
>
dc:
identifier
DBLP conf/icicdt/TriyosoJSMHSL12
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FICICDT.2012.6232870
(xsd:string)
dcterms:
issued
2012
(xsd:gYear)
rdfs:
label
Robust PEALD SiN spacer for gate first high-k metal gate integration.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/D._H._Triyoso
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jamie_K._Schaeffer
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Jeff_Shu
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Klaus_Hempel
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Markus_Lenski
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/S._Mutas
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/V._Jaschke
>
swrc:
pages
1-4
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/icicdt/2012
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/icicdt/TriyosoJSMHSL12/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/icicdt/TriyosoJSMHSL12
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/icicdt/icicdt2012.html#TriyosoJSMHSL12
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ICICDT.2012.6232870
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/icicdt
>
dc:
title
Robust PEALD SiN spacer for gate first high-k metal gate integration.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document