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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/icicdt/TriyosoMHTKKKMH17>
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dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rick_Carter>
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dc:creator <https://dblp.l3s.de/d2r/resource/authors/Z._Chen>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICICDT.2017.7993500>
foaf:homepage <https://doi.org/10.1109/ICICDT.2017.7993500>
dc:identifier DBLP conf/icicdt/TriyosoMHTKKKMH17 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICICDT.2017.7993500 (xsd:string)
dcterms:issued 2017 (xsd:gYear)
rdfs:label Characterization of atomic layer deposited low-k spacer for FDSOI high-k metal gate transistor. (xsd:string)
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foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Z._Chen>
swrc:pages 1-4 (xsd:string)
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rdfs:seeAlso <https://doi.org/10.1109/ICICDT.2017.7993500>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/icicdt>
dc:title Characterization of atomic layer deposited low-k spacer for FDSOI high-k metal gate transistor. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document