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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/icicdt/YoshidaNSIFK23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jun_Furuta>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kazutoshi_Kobayashi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Keita_Yoshida>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ryuichi_Nakajima>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shotaro_Sugitani>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Takafumi_Ito>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICICDT59917.2023.10332287>
foaf:homepage <https://doi.org/10.1109/ICICDT59917.2023.10332287>
dc:identifier DBLP conf/icicdt/YoshidaNSIFK23 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICICDT59917.2023.10332287 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label SEU Sensitivity of PMOS and NMOS Transistors in a 65 nm Bulk Process by őĪ-Particle Irradiation. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jun_Furuta>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kazutoshi_Kobayashi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Keita_Yoshida>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ryuichi_Nakajima>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shotaro_Sugitani>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Takafumi_Ito>
swrc:pages 72-75 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/icicdt/2023>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/icicdt/YoshidaNSIFK23/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/icicdt/YoshidaNSIFK23>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/icicdt/icicdt2023.html#YoshidaNSIFK23>
rdfs:seeAlso <https://doi.org/10.1109/ICICDT59917.2023.10332287>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/icicdt>
dc:title SEU Sensitivity of PMOS and NMOS Transistors in a 65 nm Bulk Process by őĪ-Particle Irradiation. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document