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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/icip/CookL95>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/B._D._Cook>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Soo-Young_Lee>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICIP.1995.529741>
foaf:homepage <https://doi.org/10.1109/ICIP.1995.529741>
dc:identifier DBLP conf/icip/CookL95 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICIP.1995.529741 (xsd:string)
dcterms:issued 1995 (xsd:gYear)
rdfs:label Fast exposure simulation for large circuit patterns in electron beam lithography. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/B._D._Cook>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Soo-Young_Lee>
swrc:pages 442-445 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/icip/1995>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/icip/CookL95/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/icip/CookL95>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/icip/icip1995-1.html#CookL95>
rdfs:seeAlso <https://doi.org/10.1109/ICIP.1995.529741>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/icip>
dc:subject electron beam lithography; proximity effect (lithography); simulation; fast exposure simulation; large circuit patterns; electron beam lithography; global exposure; local exposure; proximity effect (xsd:string)
dc:title Fast exposure simulation for large circuit patterns in electron beam lithography. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document