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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/ickii/YenHTLC22>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chih-Feng_Yen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chun-Hu_Cheng>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shen-Hao_Tsao>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shih-Hao_Lin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yu-Ya_Huang>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICKII55100.2022.9983564>
foaf:homepage <https://doi.org/10.1109/ICKII55100.2022.9983564>
dc:identifier DBLP conf/ickii/YenHTLC22 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICKII55100.2022.9983564 (xsd:string)
dcterms:issued 2022 (xsd:gYear)
rdfs:label Influence of Y2O3 Doped HfO2 High-k Films on Electrical Properties of MOS and MIM Devices. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chih-Feng_Yen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chun-Hu_Cheng>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shen-Hao_Tsao>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shih-Hao_Lin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yu-Ya_Huang>
swrc:pages 225-229 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/ickii/2022>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/ickii/YenHTLC22/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/ickii/YenHTLC22>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/ickii/ickii2022.html#YenHTLC22>
rdfs:seeAlso <https://doi.org/10.1109/ICKII55100.2022.9983564>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/ickii>
dc:title Influence of Y2O3 Doped HfO2 High-k Films on Electrical Properties of MOS and MIM Devices. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document