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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/icra/SunC0CZ14>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jianbin_Zhang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rui_Zhou_0003>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Weihai_Chen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Wenjie_Chen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Xiantao_Sun>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICRA.2014.6907184>
foaf:homepage <https://doi.org/10.1109/ICRA.2014.6907184>
dc:identifier DBLP conf/icra/SunC0CZ14 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICRA.2014.6907184 (xsd:string)
dcterms:issued 2014 (xsd:gYear)
rdfs:label Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jianbin_Zhang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rui_Zhou_0003>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Weihai_Chen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Wenjie_Chen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Xiantao_Sun>
swrc:pages 2345-2350 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/icra/2014>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/icra/SunC0CZ14/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/icra/SunC0CZ14>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/icra/icra2014.html#SunC0CZ14>
rdfs:seeAlso <https://doi.org/10.1109/ICRA.2014.6907184>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/icra>
dc:title Design of a force-decoupled compound parallel alignment stage for high-resolution imprint lithography. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document