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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/icton/IordacheSCSMBP23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Arcadie_Sobetkii>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Cristina_Antonela_Banciu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Delia_Patroi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Elena_Chitanu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Gabriela_Beatrice_Sbarcea>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Iulian_Iordache>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Virgil_Marinescu>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FICTON59386.2023.10207534>
foaf:homepage <https://doi.org/10.1109/ICTON59386.2023.10207534>
dc:identifier DBLP conf/icton/IordacheSCSMBP23 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FICTON59386.2023.10207534 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label Influence of Deposition Time on the Opto-Electronic Properties of 400 ¬įC Annealed ITO Thin Films Deposited by DC Magnetron Sputtering. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Arcadie_Sobetkii>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Cristina_Antonela_Banciu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Delia_Patroi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Elena_Chitanu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Gabriela_Beatrice_Sbarcea>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Iulian_Iordache>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Virgil_Marinescu>
swrc:pages 1-7 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/icton/2023>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/icton/IordacheSCSMBP23/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/icton/IordacheSCSMBP23>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/icton/icton2023.html#IordacheSCSMBP23>
rdfs:seeAlso <https://doi.org/10.1109/ICTON59386.2023.10207534>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/icton>
dc:title Influence of Deposition Time on the Opto-Electronic Properties of 400 ¬įC Annealed ITO Thin Films Deposited by DC Magnetron Sputtering. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document