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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/idt/SalemEEDA10>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Abdelrahman_ElMously>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Haitham_Eissa>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Mohab_H._Anis>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Mohamed_Dessouky>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Rami_F._Salem>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIDT.2010.5724398>
foaf:homepage <https://doi.org/10.1109/IDT.2010.5724398>
dc:identifier DBLP conf/idt/SalemEEDA10 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIDT.2010.5724398 (xsd:string)
dcterms:issued 2010 (xsd:gYear)
rdfs:label A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Abdelrahman_ElMously>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Haitham_Eissa>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Mohab_H._Anis>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Mohamed_Dessouky>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Rami_F._Salem>
swrc:pages 13-17 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/idt/2010>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/idt/SalemEEDA10/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/idt/SalemEEDA10>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/idt/idt2010.html#SalemEEDA10>
rdfs:seeAlso <https://doi.org/10.1109/IDT.2010.5724398>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/idt>
dc:title A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document