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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/ifip5-4/OhSHKKK23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Daejung_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jung-Hyeon_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kyoung-Whan_Oh>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ouiserg_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Seok_Heo>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Takashi_Sasa>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1007%2F978-3-031-42532-5%5F38>
foaf:homepage <https://doi.org/10.1007/978-3-031-42532-5_38>
dc:identifier DBLP conf/ifip5-4/OhSHKKK23 (xsd:string)
dc:identifier DOI doi.org%2F10.1007%2F978-3-031-42532-5%5F38 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label Reduction of Bubble-Induced Defect in Semiconductor Lithography Process. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Daejung_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jung-Hyeon_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kyoung-Whan_Oh>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ouiserg_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Seok_Heo>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Takashi_Sasa>
swrc:pages 493-503 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/ifip5-4/2023>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/ifip5-4/OhSHKKK23/dblp>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/ifip5-4/tfc2023.html#OhSHKKK23>
rdfs:seeAlso <https://doi.org/10.1007/978-3-031-42532-5_38>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/ifip5-4>
dc:title Reduction of Bubble-Induced Defect in Semiconductor Lithography Process. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document