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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/imw2/AlcalaMVMMS22>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Furqan_Mehmood>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Pramoda_Vishnumurthy>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ruben_Alcala>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Terence_Mittmann>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Thomas_Mikolajick>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Uwe_Schroeder>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIMW52921.2022.9779287>
foaf:homepage <https://doi.org/10.1109/IMW52921.2022.9779287>
dc:identifier DBLP conf/imw2/AlcalaMVMMS22 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIMW52921.2022.9779287 (xsd:string)
dcterms:issued 2022 (xsd:gYear)
rdfs:label Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Furqan_Mehmood>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Pramoda_Vishnumurthy>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ruben_Alcala>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Terence_Mittmann>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Thomas_Mikolajick>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Uwe_Schroeder>
swrc:pages 1-4 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/imw2/2022>
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/imw2/imw2022.html#AlcalaMVMMS22>
rdfs:seeAlso <https://doi.org/10.1109/IMW52921.2022.9779287>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/imw2>
dc:title Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document