Stability in Fluorine-Treated Al-Rich High Electron Mobility Transistors with 85% Al-Barrier Composition.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/irps/BacaKAADFK19
Home
|
Example Publications
Property
Value
dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/irps/BacaKAADFK19
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/A._A._Allerman
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/A._M._Armstrong
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Albert_G._Baca
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/B._A._Klein
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/E._A._Douglas
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/R._J._Kaplar
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/T._R._Fortune
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FIRPS.2019.8720524
>
foaf:
homepage
<
https://doi.org/10.1109/IRPS.2019.8720524
>
dc:
identifier
DBLP conf/irps/BacaKAADFK19
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FIRPS.2019.8720524
(xsd:string)
dcterms:
issued
2019
(xsd:gYear)
rdfs:
label
Stability in Fluorine-Treated Al-Rich High Electron Mobility Transistors with 85% Al-Barrier Composition.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/A._A._Allerman
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/A._M._Armstrong
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Albert_G._Baca
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/B._A._Klein
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/E._A._Douglas
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/R._J._Kaplar
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/T._R._Fortune
>
swrc:
pages
1-4
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/irps/2019
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/irps/BacaKAADFK19/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/irps/BacaKAADFK19
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/irps/irps2019.html#BacaKAADFK19
>
rdfs:
seeAlso
<
https://doi.org/10.1109/IRPS.2019.8720524
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/irps
>
dc:
title
Stability in Fluorine-Treated Al-Rich High Electron Mobility Transistors with 85% Al-Barrier Composition.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document