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dc:creator <https://dblp.l3s.de/d2r/resource/authors/Bruno_Allard>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Philippe_Candelier>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/S._Denorme>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/X._Federspiel>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS.2015.7112804>
foaf:homepage <https://doi.org/10.1109/IRPS.2015.7112804>
dc:identifier DBLP conf/irps/BenoistDFAC15 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS.2015.7112804 (xsd:string)
dcterms:issued 2015 (xsd:gYear)
rdfs:label Extended TDDB power-law validation for high-voltage applications such as OTP memories in High-k CMOS 28nm FDSOI technology. (xsd:string)
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foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Philippe_Candelier>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/S._Denorme>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/X._Federspiel>
swrc:pages 3 (xsd:string)
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rdfs:seeAlso <https://doi.org/10.1109/IRPS.2015.7112804>
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dc:title Extended TDDB power-law validation for high-voltage applications such as OTP memories in High-k CMOS 28nm FDSOI technology. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document