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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/ChenLHCCLH22>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._F._Cheng>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/D._S._Huang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._H._Lee>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jun_He>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/P._S._Chen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/S._C._Chen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Y._W._Lee>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS48227.2022.9764512>
foaf:homepage <https://doi.org/10.1109/IRPS48227.2022.9764512>
dc:identifier DBLP conf/irps/ChenLHCCLH22 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS48227.2022.9764512 (xsd:string)
dcterms:issued 2022 (xsd:gYear)
rdfs:label AC TDDB Analysis for HK/IL Gate Stack Breakdown and Frequency-dependent Oxygen Vacancy Trap Generation in Advanced nodes FinFET Devices by SILC Spectrum Methodology. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._F._Cheng>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/D._S._Huang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._H._Lee>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jun_He>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/P._S._Chen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/S._C._Chen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Y._W._Lee>
swrc:pages 11 (xsd:string)
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2022.html#ChenLHCCLH22>
rdfs:seeAlso <https://doi.org/10.1109/IRPS48227.2022.9764512>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title AC TDDB Analysis for HK/IL Gate Stack Breakdown and Frequency-dependent Oxygen Vacancy Trap Generation in Advanced nodes FinFET Devices by SILC Spectrum Methodology. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document