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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/FujiiHYMKSOMM21>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Atsushi_Okamoto>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Isao_Maru>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shogo_Katsuki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shohei_Hamada>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Shuntaro_Fujii>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Soichi_Morita>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tatsushi_Yagi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Toshiro_Sakamoto>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tsutomu_Miyazaki>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS46558.2021.9405217>
foaf:homepage <https://doi.org/10.1109/IRPS46558.2021.9405217>
dc:identifier DBLP conf/irps/FujiiHYMKSOMM21 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS46558.2021.9405217 (xsd:string)
dcterms:issued 2021 (xsd:gYear)
rdfs:label Impacts of Depth and Lateral Profiles of Fluorine Atoms in Gate Oxide Films on Reliability. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Atsushi_Okamoto>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Isao_Maru>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shogo_Katsuki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shohei_Hamada>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Shuntaro_Fujii>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Soichi_Morita>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tatsushi_Yagi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Toshiro_Sakamoto>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tsutomu_Miyazaki>
swrc:pages 1-5 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/irps/2021>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/irps/FujiiHYMKSOMM21/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/irps/FujiiHYMKSOMM21>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2021.html#FujiiHYMKSOMM21>
rdfs:seeAlso <https://doi.org/10.1109/IRPS46558.2021.9405217>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Impacts of Depth and Lateral Profiles of Fluorine Atoms in Gate Oxide Films on Reliability. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document