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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/JiangSKSKPUJJKR20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Brandon_Lee>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Dongkyun_Kwon>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hai_Jiang_0005>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hwasung_Rhee>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hyewon_Shim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hyun-Chul_Sagong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Jinju_Kim>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Junekyun_Park>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sangwoo_Pae>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Taeyoung_Jeong>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Taiki_Uemura>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yongsung_Ji>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yoohwan_Kim>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS45951.2020.9128322>
foaf:homepage <https://doi.org/10.1109/IRPS45951.2020.9128322>
dc:identifier DBLP conf/irps/JiangSKSKPUJJKR20 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS45951.2020.9128322 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
rdfs:label Advanced Self-heating Model and Methodology for Layout Proximity Effect in FinFET Technology. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Brandon_Lee>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Dongkyun_Kwon>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hai_Jiang_0005>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hwasung_Rhee>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hyewon_Shim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hyun-Chul_Sagong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Jinju_Kim>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Junekyun_Park>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sangwoo_Pae>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Taeyoung_Jeong>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Taiki_Uemura>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yongsung_Ji>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yoohwan_Kim>
swrc:pages 1-5 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/irps/2020>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/irps/JiangSKSKPUJJKR20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/irps/JiangSKSKPUJJKR20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2020.html#JiangSKSKPUJJKR20>
rdfs:seeAlso <https://doi.org/10.1109/IRPS45951.2020.9128322>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Advanced Self-heating Model and Methodology for Layout Proximity Effect in FinFET Technology. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document