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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/KothandaramanCM15>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chandrasekharan_Kothandaraman>
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dc:creator <https://dblp.l3s.de/d2r/resource/authors/Dan_Moy>
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dc:creator <https://dblp.l3s.de/d2r/resource/authors/Giuseppe_La_Rosa>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/J._B._Johnson>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Norman_Robson>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sami_Rosenblatt>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Subramanian_S._Iyer>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Toshiaki_Kirihata>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/X._Chen>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS.2015.7112816>
foaf:homepage <https://doi.org/10.1109/IRPS.2015.7112816>
dc:identifier DBLP conf/irps/KothandaramanCM15 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS.2015.7112816 (xsd:string)
dcterms:issued 2015 (xsd:gYear)
rdfs:label Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chandrasekharan_Kothandaraman>
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foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Dan_Moy>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Derek_Leu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Faraz_Khan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Giuseppe_La_Rosa>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/J._B._Johnson>
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foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sami_Rosenblatt>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Subramanian_S._Iyer>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Toshiaki_Kirihata>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/X._Chen>
swrc:pages 2 (xsd:string)
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2015.html#KothandaramanCM15>
rdfs:seeAlso <https://doi.org/10.1109/IRPS.2015.7112816>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Oxygen vacancy traps in Hi-K/Metal gate technologies and their potential for embedded memory applications. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document