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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/LuoSMRZSP20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Danny_Shum>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Fan_Zhang>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kalya_Shubhakar>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kin_Leong_Pey>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Laiqiang_Luo>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Nagarajan_Raghavan>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Sen_Mei>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS45951.2020.9128911>
foaf:homepage <https://doi.org/10.1109/IRPS45951.2020.9128911>
dc:identifier DBLP conf/irps/LuoSMRZSP20 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS45951.2020.9128911 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
rdfs:label Reliability and Breakdown Study of Erase Gate Oxide in Split-Gate Non-Volatile Memory Device. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Danny_Shum>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Fan_Zhang>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kalya_Shubhakar>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kin_Leong_Pey>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Laiqiang_Luo>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Nagarajan_Raghavan>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Sen_Mei>
swrc:pages 1-6 (xsd:string)
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rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2020.html#LuoSMRZSP20>
rdfs:seeAlso <https://doi.org/10.1109/IRPS45951.2020.9128911>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Reliability and Breakdown Study of Erase Gate Oxide in Split-Gate Non-Volatile Memory Device. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document