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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/MikiSMMKAO22>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Hiroshi_Miki>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/K._Asaka>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/K._Kinoshita>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/M._Sagawa>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/T._Murata>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/T._Oda>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Y._Mori>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS48227.2022.9764583>
foaf:homepage <https://doi.org/10.1109/IRPS48227.2022.9764583>
dc:identifier DBLP conf/irps/MikiSMMKAO22 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS48227.2022.9764583 (xsd:string)
dcterms:issued 2022 (xsd:gYear)
rdfs:label Accurate screening of defective oxide on SiC using consecutive multiple threshold-voltage measurements. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Hiroshi_Miki>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/K._Asaka>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/K._Kinoshita>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/M._Sagawa>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/T._Murata>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/T._Oda>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Y._Mori>
swrc:pages 8 (xsd:string)
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rdfs:seeAlso <https://doi.org/10.1109/IRPS48227.2022.9764583>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Accurate screening of defective oxide on SiC using consecutive multiple threshold-voltage measurements. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document