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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/NarasimhamLPMRST23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/A-R._Montoya>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Balaji_Narasimham>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/C._Paone>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/H._Luk>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Liming_Tsau>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Mike_Smith>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/T._Riehle>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS48203.2023.10118025>
foaf:homepage <https://doi.org/10.1109/IRPS48203.2023.10118025>
dc:identifier DBLP conf/irps/NarasimhamLPMRST23 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS48203.2023.10118025 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label Scaling Trends and the Effect of Process Variations on the Soft Error Rate of advanced FinFET SRAMs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/A-R._Montoya>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Balaji_Narasimham>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/C._Paone>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/H._Luk>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Liming_Tsau>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Mike_Smith>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/T._Riehle>
swrc:pages 1-4 (xsd:string)
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rdfs:seeAlso <https://doi.org/10.1109/IRPS48203.2023.10118025>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Scaling Trends and the Effect of Process Variations on the Soft Error Rate of advanced FinFET SRAMs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document