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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/PanarellaKSVSCLTARKA23>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Ben_Kaczer>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Cesar_J._Lockhart_de_la_Rosa>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Daire_Cott>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Dennis_Lin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Devin_Verreck>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Gouri_Sankar_Kar>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/I._Asselberghs>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/L._Panarella>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Quentin_Smets>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Stanislav_Tyaginov>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Tom_Schram>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Valeri_Afanas%27ev>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS48203.2023.10117803>
foaf:homepage <https://doi.org/10.1109/IRPS48203.2023.10117803>
dc:identifier DBLP conf/irps/PanarellaKSVSCLTARKA23 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS48203.2023.10117803 (xsd:string)
dcterms:issued 2023 (xsd:gYear)
rdfs:label Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Ben_Kaczer>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Cesar_J._Lockhart_de_la_Rosa>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Daire_Cott>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Dennis_Lin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Devin_Verreck>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Gouri_Sankar_Kar>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/I._Asselberghs>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/L._Panarella>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Quentin_Smets>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Stanislav_Tyaginov>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Tom_Schram>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Valeri_Afanas%27ev>
swrc:pages 1-6 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/irps/2023>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/irps/PanarellaKSVSCLTARKA23/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/irps/PanarellaKSVSCLTARKA23>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2023.html#PanarellaKSVSCLTARKA23>
rdfs:seeAlso <https://doi.org/10.1109/IRPS48203.2023.10117803>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document