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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/irps/WuCDHC20>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Adrian_Vaisman_Chasin>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Chen_Wu>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kris_Croes>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Naoto_Horiguchi>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Steven_Demuynck>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1109%2FIRPS45951.2020.9128328>
foaf:homepage <https://doi.org/10.1109/IRPS45951.2020.9128328>
dc:identifier DBLP conf/irps/WuCDHC20 (xsd:string)
dc:identifier DOI doi.org%2F10.1109%2FIRPS45951.2020.9128328 (xsd:string)
dcterms:issued 2020 (xsd:gYear)
rdfs:label Conduction and Breakdown Mechanisms in Low-k Spacer and Nitride Spacer Dielectric Stacks in Middle of Line Interconnects. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Adrian_Vaisman_Chasin>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Chen_Wu>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kris_Croes>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Naoto_Horiguchi>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Steven_Demuynck>
swrc:pages 1-6 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/irps/2020>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/irps/WuCDHC20/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/irps/WuCDHC20>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/irps/irps2020.html#WuCDHC20>
rdfs:seeAlso <https://doi.org/10.1109/IRPS45951.2020.9128328>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/irps>
dc:title Conduction and Breakdown Mechanisms in Low-k Spacer and Nitride Spacer Dielectric Stacks in Middle of Line Interconnects. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document