A High PSRR, Stable CMOS Current Reference using Process Insensitive TC of Resistance for Wide Temperature Applications.
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/iscas/JainAKA19
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Arpan_Jain
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Ashfakh_Ali
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Sai_Kiran
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Zia_Abbas
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FISCAS.2019.8702638
>
foaf:
homepage
<
https://doi.org/10.1109/ISCAS.2019.8702638
>
dc:
identifier
DBLP conf/iscas/JainAKA19
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FISCAS.2019.8702638
(xsd:string)
dcterms:
issued
2019
(xsd:gYear)
rdfs:
label
A High PSRR, Stable CMOS Current Reference using Process Insensitive TC of Resistance for Wide Temperature Applications.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Arpan_Jain
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Ashfakh_Ali
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Sai_Kiran
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Zia_Abbas
>
swrc:
pages
1-5
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/iscas/2019
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/iscas/JainAKA19/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/iscas/JainAKA19
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/iscas/iscas2019.html#JainAKA19
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ISCAS.2019.8702638
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/iscas
>
dc:
title
A High PSRR, Stable CMOS Current Reference using Process Insensitive TC of Resistance for Wide Temperature Applications.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document