Effectiveness of low power dual-Vt designs in nano-scale technologies under process parameter variations.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/islped/AgarwalKBGR05
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Effectiveness of low power dual-Vt designs in nano-scale technologies under process parameter variations.
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dual-Vt, leakage, metal gate, process variation, yield
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Effectiveness of low power dual-Vt designs in nano-scale technologies under process parameter variations.
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