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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/islped/NeauR03>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Cassondra_Neau>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Kaushik_Roy_0001>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1145%2F871506.871537>
foaf:homepage <https://doi.org/10.1145/871506.871537>
dc:identifier DBLP conf/islped/NeauR03 (xsd:string)
dc:identifier DOI doi.org%2F10.1145%2F871506.871537 (xsd:string)
dcterms:issued 2003 (xsd:gYear)
rdfs:label Optimal body bias selection for leakage improvement and process compensation over different technology generations. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Cassondra_Neau>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Kaushik_Roy_0001>
swrc:pages 116-121 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/islped/2003>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/islped/NeauR03/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/islped/NeauR03>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/islped/islped2003.html#NeauR03>
rdfs:seeAlso <https://doi.org/10.1145/871506.871537>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/islped>
dc:subject CMOS scaling, band-to-band tunneling, body bias, leakage components, leakage current, process compensation, process variation, substrate bias (xsd:string)
dc:title Optimal body bias selection for leakage improvement and process compensation over different technology generations. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document