Sputtering of Metal Oxide Semiconductor n-p Stacks.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/isoen/FasoliTLSB19
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dcterms:
bibliographicCitation
<
http://dblp.uni-trier.de/rec/bibtex/conf/isoen/FasoliTLSB19
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Andrea_Fasoli
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/K._Lionti
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/L._Bozano
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/L._Thornquist
>
dc:
creator
<
https://dblp.l3s.de/d2r/resource/authors/Linda_K._Sundberg
>
foaf:
homepage
<
http://dx.doi.org/doi.org%2F10.1109%2FISOEN.2019.8823393
>
foaf:
homepage
<
https://doi.org/10.1109/ISOEN.2019.8823393
>
dc:
identifier
DBLP conf/isoen/FasoliTLSB19
(xsd:string)
dc:
identifier
DOI doi.org%2F10.1109%2FISOEN.2019.8823393
(xsd:string)
dcterms:
issued
2019
(xsd:gYear)
rdfs:
label
Sputtering of Metal Oxide Semiconductor n-p Stacks.
(xsd:string)
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Andrea_Fasoli
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/K._Lionti
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/L._Bozano
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/L._Thornquist
>
foaf:
maker
<
https://dblp.l3s.de/d2r/resource/authors/Linda_K._Sundberg
>
swrc:
pages
1-3
(xsd:string)
dcterms:
partOf
<
https://dblp.l3s.de/d2r/resource/publications/conf/isoen/2019
>
owl:
sameAs
<
http://bibsonomy.org/uri/bibtexkey/conf/isoen/FasoliTLSB19/dblp
>
owl:
sameAs
<
http://dblp.rkbexplorer.com/id/conf/isoen/FasoliTLSB19
>
rdfs:
seeAlso
<
http://dblp.uni-trier.de/db/conf/isoen/isoen2019.html#FasoliTLSB19
>
rdfs:
seeAlso
<
https://doi.org/10.1109/ISOEN.2019.8823393
>
swrc:
series
<
https://dblp.l3s.de/d2r/resource/conferences/isoen
>
dc:
title
Sputtering of Metal Oxide Semiconductor n-p Stacks.
(xsd:string)
dc:
type
<
http://purl.org/dc/dcmitype/Text
>
rdf:
type
swrc:InProceedings
rdf:
type
foaf:Document