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dcterms:bibliographicCitation <http://dblp.uni-trier.de/rec/bibtex/conf/ispd/ChenCC10>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Huang-Yu_Chen>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Szu-Jui_Chou>
dc:creator <https://dblp.l3s.de/d2r/resource/authors/Yao-Wen_Chang>
foaf:homepage <http://dx.doi.org/doi.org%2F10.1145%2F1735023.1735052>
foaf:homepage <https://doi.org/10.1145/1735023.1735052>
dc:identifier DBLP conf/ispd/ChenCC10 (xsd:string)
dc:identifier DOI doi.org%2F10.1145%2F1735023.1735052 (xsd:string)
dcterms:issued 2010 (xsd:gYear)
rdfs:label Density gradient minimization with coupling-constrained dummy fill for CMP control. (xsd:string)
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Huang-Yu_Chen>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Szu-Jui_Chou>
foaf:maker <https://dblp.l3s.de/d2r/resource/authors/Yao-Wen_Chang>
swrc:pages 105-111 (xsd:string)
dcterms:partOf <https://dblp.l3s.de/d2r/resource/publications/conf/ispd/2010>
owl:sameAs <http://bibsonomy.org/uri/bibtexkey/conf/ispd/ChenCC10/dblp>
owl:sameAs <http://dblp.rkbexplorer.com/id/conf/ispd/ChenCC10>
rdfs:seeAlso <http://dblp.uni-trier.de/db/conf/ispd/ispd2010.html#ChenCC10>
rdfs:seeAlso <https://doi.org/10.1145/1735023.1735052>
swrc:series <https://dblp.l3s.de/d2r/resource/conferences/ispd>
dc:subject chemical-mechanical polishing, density gradient, dummy fill, manufacturability (xsd:string)
dc:title Density gradient minimization with coupling-constrained dummy fill for CMP control. (xsd:string)
dc:type <http://purl.org/dc/dcmitype/Text>
rdf:type swrc:InProceedings
rdf:type foaf:Document