Analysis, modeling and silicon correlation of low-voltage flop data retention in 28nm process technology.
Resource URI: https://dblp.l3s.de/d2r/resource/publications/conf/isqed/DattaADRTCSCTKSBPYT13
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Analysis, modeling and silicon correlation of low-voltage flop data retention in 28nm process technology.
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Analysis, modeling and silicon correlation of low-voltage flop data retention in 28nm process technology.
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